Method and apparatus for cleaning and polishing automobiles Download PDF Info ... US1934494A US311351A US31135128A US1934494A US 1934494 A US1934494 A US 1934494A US 311351 A US311351 A US 311351A US 31135128 A US31135128 A US 31135128A US 1934494 A US1934494 A US 1934494A Authority US United States Prior art
MoreApparatus and method for the controlled lubrication and cleaning of conveyors US6945383B2 (en) * 2000-05-30: 2005-09-20: Hewlett-Packard Development Company, L.P. Dispensing applicator and method of use US6971503B2 (en) * 2003-11-26: 2005-12-06: Cynthia Thompson: Conveyor belt cleaning apparatus
MoreThe present invention is directed to a method and an apparatus for cleaning and drying wafers. The apparatus includes an injection unit having first and second injection ports configured for injecting different fluids and arranged in a moving direction of the rose or on a line adjacent to the moving direction. The injection unit migrates straightly from the center of a wafer to the edge ...
MoreThe present invention is directed to a method and an apparatus for cleaning and drying wafers. The apparatus includes an injection unit having first and second injection ports configured for injecting different fluids and arranged in a moving direction of the rose or on a line adjacent to the moving direction. The injection unit migrates straightly from the center of a wafer to the edge ...
MoreMethod and apparatus for cleaning and polishing automobiles Download PDF Info ... US1934494A US311351A US31135128A US1934494A US 1934494 A US1934494 A US 1934494A US 311351 A US311351 A US 311351A US 31135128 A US31135128 A US 31135128A US 1934494 A US1934494 A US 1934494A Authority US United States Prior art
MoreApparatus and method for the controlled lubrication and cleaning of conveyors US6945383B2 (en) * 2000-05-30: 2005-09-20: Hewlett-Packard Development Company, L.P. Dispensing applicator and method of use US6971503B2 (en) * 2003-11-26: 2005-12-06: Cynthia Thompson: Conveyor belt cleaning apparatus
MoreThe present invention is directed to a method and an apparatus for cleaning and drying wafers. The apparatus includes an injection unit having first and second injection ports configured for injecting different fluids and arranged in a moving direction of the rose or on a line adjacent to the moving direction. The injection unit migrates straightly from the center of a wafer to the edge ...
MoreUS2279686A - Method and apparatus for cleaning and painting - Google Patents Method and apparatus for cleaning and painting Download PDF Info Publication number US2279686A. US2279686A US397264A US39726441A US2279686A US 2279686 A US2279686 A US 2279686A US 397264 A US397264 A US 397264A US 39726441 A US39726441 A US
More23.08.2000 Justia Patents Using Sequentially Applied Treating Agents US Patent for Method and apparatus for cleaning/drying hydrophobic wafers Patent (Patent # 6,468,362) Method and apparatus for cleaning/drying hydrophobic wafers . Aug 23, 2000 - Applied Materials, Inc. A method and an apparatus that uses a surfactant to clean a hydrophobic wafer is provided. In
More31.07.2002 1 Abstract. This invention relates to a method and apparatus for cleaning solid surfaces like Si substrate, disk or magnetic head slider where contaminants, including organic contaminants, especially particles in the micron or sub-micron scale are effectively remove from the solid surfaces. The invention achieves this by generating a strong ...
More18.03.2014 Justia Patents Cleaning Or Laundering US Patent for Cleaning apparatus and method Patent (Patent # 9,850,619) Cleaning apparatus and method . Mar 18, 2014 - Xeros Limited. The invention provides an apparatus and method for use in the treatment of substrates, whereby the apparatus comprises housing means having mounted therein a rotatably
MoreApparatus and methods for cleaning rollers US8069520B2 (en) 2006-02-13: 2011-12-06: Black Decker: Power mop with exposable scrub brush US20080216694A1 (en) * 2007-03-06: 2008-09-11: Man Roland Druckmaschinen Ag: Apparatus and method for cleaning guide rollers of a printing unit US20110072993A1 (en) *
MoreMethod and apparatus for cleaning conveyor belts ... US5497872A US08/269,884 US26988494A US5497872A US 5497872 A US5497872 A US 5497872A US 26988494 A US26988494 A US 26988494A US 5497872 A US5497872 A US 5497872A Authority US United States Prior art keywords belt conveyor cleaning roller ribs speed Prior art date 1994-07-01
MoreMethod and apparatus for cleaning and polishing automobiles Download PDF Info ... US1934494A US311351A US31135128A US1934494A US 1934494 A US1934494 A US 1934494A US 311351 A US311351 A US 311351A US 31135128 A US31135128 A US 31135128A US 1934494 A US1934494 A US 1934494A Authority US United States Prior art
MoreA conveyor belt cleaning and sanitizing apparatus includes a hollow porous roller situated on the obscured or return loop side of the conveyor belt, out of sight of the top or conveying surface of the belt. A perforated rod, positioned within the hollow porous roller, contains a cleaning and sanitizing solution, dispensable through a series of perforations in the rod.
MoreThe present invention is directed to a method and an apparatus for cleaning and drying wafers. The apparatus includes an injection unit having first and second injection ports configured for injecting different fluids and arranged in a moving direction of the rose or on a line adjacent to the moving direction. The injection unit migrates straightly from the center of a wafer to the edge ...
MoreUS2279686A - Method and apparatus for cleaning and painting - Google Patents Method and apparatus for cleaning and painting Download PDF Info Publication number US2279686A. US2279686A US397264A US39726441A US2279686A US 2279686 A US2279686 A US 2279686A US 397264 A US397264 A US 397264A US 39726441 A US39726441 A US
More23.08.2000 A method and an apparatus that uses a surfactant to clean a hydrophobic wafer is provided. In a first aspect, the method may clean and dry a wafer without applying pure DI water to the wafer. In a second aspect, the method may clean a wafer by applying pure DI water to the wafer only for a short duration of time such that the DI water application ceases prior to or as
More31.07.2002 1 Abstract. This invention relates to a method and apparatus for cleaning solid surfaces like Si substrate, disk or magnetic head slider where contaminants, including organic contaminants, especially particles in the micron or sub-micron scale are effectively remove from the solid surfaces. The invention achieves this by generating a strong ...
More18.03.2014 Justia Patents Cleaning Or Laundering US Patent for Cleaning apparatus and method Patent (Patent # 9,850,619) Cleaning apparatus and method . Mar 18, 2014 - Xeros Limited. The invention provides an apparatus and method for use in the treatment of substrates, whereby the apparatus comprises housing means having mounted therein a rotatably
MoreApparatus and methods for cleaning rollers US8069520B2 (en) 2006-02-13: 2011-12-06: Black Decker: Power mop with exposable scrub brush US20080216694A1 (en) * 2007-03-06: 2008-09-11: Man Roland Druckmaschinen Ag: Apparatus and method for cleaning guide rollers of a printing unit US20110072993A1 (en) *
MoreMethod and apparatus for cleaning conveyor belts ... US5497872A US08/269,884 US26988494A US5497872A US 5497872 A US5497872 A US 5497872A US 26988494 A US26988494 A US 26988494A US 5497872 A US5497872 A US 5497872A Authority US United States Prior art keywords belt conveyor cleaning roller ribs speed Prior art date 1994-07-01
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